Micro announced this week at a financial phone meeting that it has begun to provide customers with the first batch of LPDDR5X memory products that adopt the new generation of 1γ (1-gamma) processes and introduce extreme ultraviolet light (EUV) microfilm technology. This also shows that Micron has officially entered the EUV DRAM process era.
Microtron executive Sanjay Mehrotra pointed out that the current progress of 1γ DRAM technology is very smooth, and the yield climbing speed even exceeds the 1ß (1-beta) record. The company completed several key product milestones this season, including the first LPDDR5 DRAM certified product shipments based on 1γ process.
1γ process is the sixth generation 10-nanometer process stage of Micron, with a power consumption reduction of 20% and a 15% increase in performance compared to the previous generation 1ß. In addition, the bit density of 1γ is increased by 30%, and production costs are expected to be reduced as yield increases.
It is worth noting that this batch of LPDDR5X based on the 1γ process is not the first product to use this technology. Micron also launched the 16Gb DDR5-9200 memory chip this year, focusing on higher performance and lower power consumption, but has not announced the latest product developments.
Looking ahead, Micron plans to fully introduce the sixth generation 10-nanometer 1γ process, covering DDR5, LPDDR5X (up to 10.7 GT/s), GDDR7 and data center-related memory product lines. Mehrotra emphasizes that it will introduce 1γ process online on all DRAM products to maximize the benefits of this leading technology.
Currently Micron is the last major DRAM manufacturer to use EUV Microfilm. Although Micron has not disclosed how many levels use EUV technology, the push may be mainly used for key layers that originally require complex multiple exposures. Micron has launched its first EUV equipment in Japan and started mass production of 1γ DRAM, and will also expand EUV production in Japan and Taiwan in the future.
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